Optimal design method and device for precision alignment platform of nanoimprint lithography equipment

The invention discloses an optimal design method and device for a precision alignment platform of nanoimprint lithography equipment. The optimal design method comprises the following steps: acquiringa parallel mechanism meeting design requirements; performing optimization calculation on the structur...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LAI JUNHAO, ZHAN WANGHU, ZHU DACHANG, ZENG JUNHAI, HE XIANGHUA, YANG JIAMOU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING PHYSICS
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