Optimal design method and device for precision alignment platform of nanoimprint lithography equipment

The invention discloses an optimal design method and device for a precision alignment platform of nanoimprint lithography equipment. The optimal design method comprises the following steps: acquiringa parallel mechanism meeting design requirements; performing optimization calculation on the structural parameters of the parallel mechanism to obtain optimal structural parameters of the parallel mechanism; calculating an optimal input/output mapping matrix according to the optimal structure parameters, and obtaining an expected mapping matrix after correction; performing optimization solution ona preset topological optimization model according to the optimization constraint to obtain a precision alignment platform unit density distribution diagram; and finally, conducting boundary line drawing on the unit density distribution diagram, and obtaining a precision alignment platform machining model defined by boundary lines. By implementing the optimal design method, the precise alignment platform meeting the precis