Pressure control device and semiconductor equipment

The invention discloses a pressure control device and semiconductor equipment. A reaction chamber is connected with a vacuum generator. The pressure control device comprises a pressure sensor used formeasuring the pressure P of the reaction chamber in real time, an electric control pressure regulati...

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1. Verfasser: LU YANXIAO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses a pressure control device and semiconductor equipment. A reaction chamber is connected with a vacuum generator. The pressure control device comprises a pressure sensor used formeasuring the pressure P of the reaction chamber in real time, an electric control pressure regulating valve which is connected with a compressed air inlet end of the vacuum generator and used for regulating the air exhaust pressure of a negative pressure opening end of the vacuum generator, an opening degree regulating mechanism which is arranged on a pipeline for connecting the reaction chamberwith the negative pressure opening end of the vacuum generator and is used for regulating the exhaust flow of the reaction chamber, and a controller, wherein a pressure set value of the electric control pressure regulating valve is regulated according to a difference value between the pressure P and the target pressure P0, so the air exhaust pressure of the negative pressure opening end of the vacuum generator is regulate