REDOX ATOMIC LAYER DEPOSITION

Method to deposit a layer of inorganic material on a substrate surface, comprising one or more cycles, each cycle comprising the steps of:a) contacting the substrate surface with a first aqueous liquid solution comprising an organic compound having a functional group permitting its adsorption on the substrate, followed by b) contacting the substrate surface having the organic compound adsorbed thereon with a second liquid aqueous solution comprising an inorganic ion or an ion complex suitable for oxidizing the organic compound and having an insoluble reduction product which is the inorganic material. 一种在基材表面上沉积一层无机材料的方法，所述方法包括一个或多个循环，每个循环包括如下步骤：a)使得基材表面与含有有机化合物的第一液体水性溶液接触，所述有机化合物具有允许其吸附到基材的官能团，随后b)使得具有吸附于其上的有机化合物的基材表面与包含适用于使有机化合物氧化并具有不溶性还原产物的无机离子或离子络合物的第二液体水性溶液接触，所述不溶性还原产物是无机材料。