Display and preparation method thereof

The invention relates to a display and a preparation method thereof. In the preparation method of the display, the applied mask adopts a silicon wafer as a main body, and the silicon wafer is providedwith a plurality of openings formed by a through silicon via technology. The openings of the mask are formed by adopting the through silicon via technology and are not limited by a preparation technology of the metal mask, so that the size of the openings in the mask can be reduced, and the pixel density of the display is further increased. 本发明涉及一种显示器及其制备方法。该显示器的制备方法中，所使用的掩膜版采用硅晶片作为主体，且硅晶片上具有多个采用硅通孔技术形成的开口。该掩膜版的开口采用硅通孔技术形成，不受限于金属掩膜版的制备技术，从而可以减小掩膜版上的开口大小，进而增加显示器的像素密度。