SYSTEM, METHOD AND COMPUTER PROGRAM PRODUCT FOR SYSTEMATIC AND STOCHASTIC CHARACTERIZATION OF PATTERN DEFECTS IDENTIFIED FROM A FABRICATED COMPONENT

A system, a method, and a computer program product are provided for systematic and stochastic characterization of pattern defects identified from a fabricated component. In use, a plurality of patterndefects detected from a fabricated component are identified. Additionally, attributes of each of the...

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Bibliographische Detailangaben
Hauptverfasser: PARK ALLEN, PREIL MOSHE E, CROSS ANDREW JAMES
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A system, a method, and a computer program product are provided for systematic and stochastic characterization of pattern defects identified from a fabricated component. In use, a plurality of patterndefects detected from a fabricated component are identified. Additionally, attributes of each of the pattern defects are analyzed, based on predefined criteria. Further, a first set of pattern defects of the plurality of pattern defects are determined, from the analysis, to be systematic pattern defects, and a second set of pattern defects of the plurality of pattern defects are determined, fromthe analysis, to be stochastic pattern defects. Moreover, a first action is performed for the determined systematic pattern defects and a second action is performed for the determined stochastic pattern defects. 本发明提供一种用于从所制造组件识别的图案缺陷的系统性及随机性表征的系统、方法及计算机程序产品。在使用中,识别从所制造组件检测的多个图案缺陷。另外,基于预定义准则来分析所述图案缺陷中的每一者的属性。此外,从所述分析确定所述多个图案缺陷的第一组图案缺陷是系统图案缺陷,且从所述分析确定所述多个图案缺陷的第二组图案缺陷是随机图案缺陷。此外,针对所述经确定系统图案缺陷执行第一动作,且针对所述经确定随机图案缺陷执行第二动作。