Method for preparing two-dimensional ultrathin silicon wafer loaded silver nanoparticles
The invention discloses a method for preparing two-dimensional ultrathin silicon wafer loaded silver nanoparticles. The method includes the following steps that firstly, calcium silicide is put into concentrated hydrochloric acid to be reacted, filtered and washed, vacuum drying is conducted, and a...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a method for preparing two-dimensional ultrathin silicon wafer loaded silver nanoparticles. The method includes the following steps that firstly, calcium silicide is put into concentrated hydrochloric acid to be reacted, filtered and washed, vacuum drying is conducted, and a Si6H6 nano sheet is obtained; secondly, silver nitrate is dissolved into amine which can form a complexing effect with Ag+, and a silver nitrate amine solution is prepared; and thirdly, the Si6H6 nano sheet is ultrasonically dispersed in an organic solvent and is added to the silver nitrate amine solution, reacting, filtering and washing are conducted, and a two-dimensional ultrathin silicon wafer loaded silver nanoparticle composite material is obtained. By means of the method, the concentratedhydrochloric acid and the layered compound calcium silicide are reacted to generate the Si6H6 nano sheet, then the Si6H6 nano sheet is added to a silver nitrate and amine complex compound, and the two-dimensional ultrathin s |
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