SUBSTRATE PROCESSING APPARATUS AND MANUFACTURING METHOD OF ELECTRONIC COMPONENT

The invention provides a substrate processing apparatus and a method of manufacturing an electronic component, and aims to suppress mixing of atmosphere gas between processing regions in a substrate processing apparatus having a plurality of processing regions in one chamber. The substrate processin...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WATABE ARATA, ABE YOSHIKO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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