SENSOR MARK AND METHOD OF MANUFACTURING SENSOR MARK

A sensor mark (17) comprises a substrate (200) having: a first deep ultra violet (DUV) absorbing layer (310, 320, 330) comprising a first material which substantially absorbs DUV radiation; a first protecting layer (600) comprising a second material; wherein: the first DUV absorbing layer has a firs...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NASALEVICH MAXIM, NIKIPELOV ANDREY, WRICKE SANDRO, BANINE VADIM, WELTERS WILHELMUS, BECKERS JOHAN, VLES DAVID, KLUGKIST JOOST, STAS ROLAND, JAMBUNATHAN MADHUSUDHANAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY COLORIMETRY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RADIATION PYROMETRY TESTING
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