Device including radiation emitter for applying radiation to target, and related methods

A device for applying radiation to a target is provided. The device includes a radiation emitter to emit electromagnetic radiation having a peak emission wavelength in the range from 10 nm-1 mm, and afirst reflector that extends in a length direction with a concave cross section. The first reflector...

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Hauptverfasser: HECK JOHANNA, LEONHARDT DARRIN, SPRANKLE DAVID, PEIL MICHAEL, DIETTRICH JORG
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A device for applying radiation to a target is provided. The device includes a radiation emitter to emit electromagnetic radiation having a peak emission wavelength in the range from 10 nm-1 mm, and afirst reflector that extends in a length direction with a concave cross section. The first reflector defines a cavity area having a perimeter, and includes an inward facing reflective border for at least 50% of the perimeter of the cavity area. Radiation is provided to the cavity area with an intensity distribution I and a maximum intensity Imax. The cavity area includes a focal area defined by all points at which a normalized intensity I/Imax is greater than 0.2. A width of the focal area is 0.0001-0.5 times a width of the cavity area. 提供了一种用于将辐射施加到靶的装置。所述装置包括:辐射发射器,所述辐射发射器发射峰值发射波长在10nm至1mm的范围内的电磁辐射;以及第一反射器,所述第一反射器在长度方向上延伸并且具有凹横截面。所述第一反射器界定具有周界的空腔区域,并且包括用于所述空腔区域的所述周界的至少50%的内向反射边界。向所述空腔区域提供具有强度分布I和最大强度I的辐射。所述空腔区域包括由归一化强度I/I大于0.2的所有点界定的聚焦区域。所述聚焦区域的宽度是所述空腔区域的宽度的0.0001倍至0.5倍。