Reaction chamber and semiconductor processing device

The invention provides a reaction chamber and a semiconductor processing device. The reaction chamber comprises a chamber side wall, a chamber bottom wall, a heat exchange element and a heat exchangesource for providing energy, wherein the heat exchange element includes a first part uniformly distributed on the chamber side wall and a second part uniformly distributed on the chamber bottom wall.According to the reaction chamber provided in the invention, the problem that temperature uniformity is hard to ensure by using a plurality of heaters can be avoided, and the temperature uniformity inthe chamber can also be ensured. 本发明提供一种反应腔室及半导体加工设备，其包括腔室侧壁和腔室底壁，还包括热交换元件和用于提供能量的热交换源，其中，热交换元件包括均匀分布在腔室侧壁中的第一部分，和均匀分布在腔室底壁中的第二部分。本发明提供的反应腔室，其可以避免使用多个加热器很难保证温度一致性的问题，而且还可以保证腔室温度均匀性。