Quantum dot material, and preparation method and application thereof

The invention provides a quantum dot material, and a preparation method and an application thereof. The quantum dot material comprises a quantum dot, and a first cladding layer and a second cladding layer which clad the outer side of the quantum dot, wherein the first cladding layer is located betwe...

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Bibliographische Detailangaben
Hauptverfasser:	SUN XIAOWEI, FANG FAN, YANG HONGCHENG, WANG KAI, XU BING, LIU YIZUN, LI XIANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ADHESIVES CHEMISTRY DYES MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NANOTECHNOLOGY NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING
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Beschreibung
Zusammenfassung:	The invention provides a quantum dot material, and a preparation method and an application thereof. The quantum dot material comprises a quantum dot, and a first cladding layer and a second cladding layer which clad the outer side of the quantum dot, wherein the first cladding layer is located between the quantum dot and the second cladding layer. The quantum dot material has the advantages of good water-oxygen barrier property and good stability. 本发明提供了一种量子点材料及其制备方法和应用，包括量子点以及包覆在量子点外侧的第一包覆层和第二包覆层；其中，所述第一包覆层位于所述量子点和所述第二包覆层之间。本发明提供的量子点材料的水氧阻隔性好，稳定性好。