Gas distribution plate and plasma processing apparatus including same

A gas distribution plate and a plasma processing apparatus including the same are provided. The plasma processing apparatus may include a support configured to receive a substrate; a gas distributionplate (GDP) including a plurality of nozzles facing the support; a main splitter configured to supply a process gas; and an additional splitter configured to supply an acceleration gas or a deceleration gas. The plurality of nozzles may include a plurality of central nozzles, a plurality of outer nozzles, a plurality of middle nozzles configured to spray the process gas and the acceleration gas, aplurality of first nozzles, and a plurality of second nozzles. 提供了一种气体分布板和一种包括该气体分布板的等离子体处理设备。所述等离子体处理设备可以包括：支撑件，被构造为接收基底；气体分布板(GDP)，包括面对支撑件的多个喷嘴；主分流器，被构造为供应处理气体；以及附加分流器，被构造为供应加速气体或减速气体。多个喷嘴可以包括多个中心喷嘴、多个外围喷嘴、被构造为喷射处理气体和加速气体的多个中间喷嘴、多个第一喷嘴和多个第二喷嘴。