METHOD FOR MANUFACTURING INTAGLIO AND INTAGLIO MANUFACTURING DEVICE
Provided is a technique for manufacturing an intaglio by exposing a light-sensitive material, wherein the depth of the recess is separately controlled for each opening size, and it is possible to reduce the time required for manufacturing. This invention related to a method for manufacturing an inta...
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| creator | MURAMOTO SHUJI MASUO JUNICHI KAWAGOE MASAFUMI |
| description | Provided is a technique for manufacturing an intaglio by exposing a light-sensitive material, wherein the depth of the recess is separately controlled for each opening size, and it is possible to reduce the time required for manufacturing. This invention related to a method for manufacturing an intaglio having a flat section and a plurality of recesses comprises: a first step (step S103) for exposing and curing a region that is a flat section within a light-sensitive layer formed with a light-curable material, using a first amount of light exposure necessary to achieve a target depth in the recesses having a first aperture size that is the smallest aperture size; and a second step (step S106) for exposing a second region of the light-sensitive layer comprising recesses having a second aperture size that is larger than the first size, without exposing the first region of the light-sensitive layer comprising the recesses having the first size.
本发明提供一种技术，在通过使感光性材料曝光而制造凹版的情况下，可针对每一种开口尺寸单独地控制凹部的深度，且可缩短制造所需的时间。有关具有 |
| format | Patent |
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本发明提供一种技术，在通过使感光性材料曝光而制造凹版的情况下，可针对每一种开口尺寸单独地控制凹部的深度，且可缩短制造所需的时间。有关具有</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191001&DB=EPODOC&CC=CN&NR=110300930A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191001&DB=EPODOC&CC=CN&NR=110300930A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MURAMOTO SHUJI</creatorcontrib><creatorcontrib>MASUO JUNICHI</creatorcontrib><creatorcontrib>KAWAGOE MASAFUMI</creatorcontrib><title>METHOD FOR MANUFACTURING INTAGLIO AND INTAGLIO MANUFACTURING DEVICE</title><description>Provided is a technique for manufacturing an intaglio by exposing a light-sensitive material, wherein the depth of the recess is separately controlled for each opening size, and it is possible to reduce the time required for manufacturing. This invention related to a method for manufacturing an intaglio having a flat section and a plurality of recesses comprises: a first step (step S103) for exposing and curing a region that is a flat section within a light-sensitive layer formed with a light-curable material, using a first amount of light exposure necessary to achieve a target depth in the recesses having a first aperture size that is the smallest aperture size; and a second step (step S106) for exposing a second region of the light-sensitive layer comprising recesses having a second aperture size that is larger than the first size, without exposing the first region of the light-sensitive layer comprising the recesses having the first size.
本发明提供一种技术，在通过使感光性材料曝光而制造凹版的情况下，可针对每一种开口尺寸单独地控制凹部的深度，且可缩短制造所需的时间。有关具有</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHD2dQ3x8HdRcPMPUvB19At1c3QOCQ3y9HNX8PQLcXT38fRXcPRzQXBQ1bi4hnk6u_IwsKYl5hSn8kJpbgZFN9cQZw_d1IL8-NTigsTk1LzUknhnP0NDA2MDA0tjA0djYtQAADGrK20</recordid><startdate>20191001</startdate><enddate>20191001</enddate><creator>MURAMOTO SHUJI</creator><creator>MASUO JUNICHI</creator><creator>KAWAGOE MASAFUMI</creator><scope>EVB</scope></search><sort><creationdate>20191001</creationdate><title>METHOD FOR MANUFACTURING INTAGLIO AND INTAGLIO MANUFACTURING DEVICE</title><author>MURAMOTO SHUJI ; MASUO JUNICHI ; KAWAGOE MASAFUMI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN110300930A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>MURAMOTO SHUJI</creatorcontrib><creatorcontrib>MASUO JUNICHI</creatorcontrib><creatorcontrib>KAWAGOE MASAFUMI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MURAMOTO SHUJI</au><au>MASUO JUNICHI</au><au>KAWAGOE MASAFUMI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD FOR MANUFACTURING INTAGLIO AND INTAGLIO MANUFACTURING DEVICE</title><date>2019-10-01</date><risdate>2019</risdate><abstract>Provided is a technique for manufacturing an intaglio by exposing a light-sensitive material, wherein the depth of the recess is separately controlled for each opening size, and it is possible to reduce the time required for manufacturing. This invention related to a method for manufacturing an intaglio having a flat section and a plurality of recesses comprises: a first step (step S103) for exposing and curing a region that is a flat section within a light-sensitive layer formed with a light-curable material, using a first amount of light exposure necessary to achieve a target depth in the recesses having a first aperture size that is the smallest aperture size; and a second step (step S106) for exposing a second region of the light-sensitive layer comprising recesses having a second aperture size that is larger than the first size, without exposing the first region of the light-sensitive layer comprising the recesses having the first size.
本发明提供一种技术，在通过使感光性材料曝光而制造凹版的情况下，可针对每一种开口尺寸单独地控制凹部的深度，且可缩短制造所需的时间。有关具有</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | METHOD FOR MANUFACTURING INTAGLIO AND INTAGLIO MANUFACTURING DEVICE |
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