METHOD FOR MANUFACTURING INTAGLIO AND INTAGLIO MANUFACTURING DEVICE

Provided is a technique for manufacturing an intaglio by exposing a light-sensitive material, wherein the depth of the recess is separately controlled for each opening size, and it is possible to reduce the time required for manufacturing. This invention related to a method for manufacturing an inta...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MURAMOTO SHUJI, MASUO JUNICHI, KAWAGOE MASAFUMI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:Provided is a technique for manufacturing an intaglio by exposing a light-sensitive material, wherein the depth of the recess is separately controlled for each opening size, and it is possible to reduce the time required for manufacturing. This invention related to a method for manufacturing an intaglio having a flat section and a plurality of recesses comprises: a first step (step S103) for exposing and curing a region that is a flat section within a light-sensitive layer formed with a light-curable material, using a first amount of light exposure necessary to achieve a target depth in the recesses having a first aperture size that is the smallest aperture size; and a second step (step S106) for exposing a second region of the light-sensitive layer comprising recesses having a second aperture size that is larger than the first size, without exposing the first region of the light-sensitive layer comprising the recesses having the first size. 本发明提供一种技术,在通过使感光性材料曝光而制造凹版的情况下,可针对每一种开口尺寸单独地控制凹部的深度,且可缩短制造所需的时间。有关具有