Fluid handling structure, lithographic apparatus and device manufacturing method

A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially o...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ROPS CORNELIUS MARIA, WERNAART WILHELMUS ANTONIUS, VAN DER ZANDEN FREDERIK ANTONIUS, STALS WALTER THEODORUS MATHEUS, GATTOBIGIO GIOVANNI LUCA, BLANCO CARBALLO VICTOR MANUEL, VAN DER HAM RONALD, EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA, BESSEMS DAVID
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS SEPARATION TRANSPORTING
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