Fluid handling structure, lithographic apparatus and device manufacturing method

A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space. 一种用于光刻设备的流体处理结构被配置成将浸没流体容纳至一区域，流体处理结构在空间的边界处具有：至少一个气刀开口，在从该空间沿径向向外的方向上；和至少一个气体供应开口，在相对于该空间从至少气刀开口沿径向向外的方向上。气刀开口和气体供应开口都提供基本上纯的CO气体，以便在邻近该空间处和在该空间的径向外侧提供基本上纯的CO气体环境。