LITHOGRAPHY SYSTEM AND METHOD

The present invention provides a lithography system (200) having a projection lens (104) comprising: a first optical element (208), a first sensor subframe (212), a first sensor (218), which is configured to detect a position of the first optical element (208) with respect to the first sensor subfra...

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Bibliographische Detailangaben
1. Verfasser:	GEUPPERT BERNHARD
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention provides a lithography system (200) having a projection lens (104) comprising: a first optical element (208), a first sensor subframe (212), a first sensor (218), which is configured to detect a position of the first optical element (208) with respect to the first sensor subframe (212), and a second sensor (220), which is configured to detect a position of a wafer (124) withrespect to the first sensor subframe (212). 本发明提供具有投射镜头(104)的光刻系统(200)，其包含：第一光学元件(208)、第一传感器副框(212)、配置为检测第一光学元件(208)相对于第一传感器副框(212)的位置的第一传感器(218)以及配置为检测晶片(124)相对于第一传感器副框(212)的位置的第二传感器(220)。