Method for protecting edge of photoluminescence nano material thin film

The invention relates to a method for protecting the edge of a photoluminescence nano material thin film. According to the method, an isolation layer is deposited on the edge of a photoluminescence nano material thin film through an atomic layer deposition method, the isolating layer can block oxygen and water, so that the service life of the photoluminescence nanometer material film is prolonged.In the atomic layer deposition process, the edge of the light-emitting nano material thin film is provided with the glue material, the surface of the glue material contains hydroxyl, so that the deposition of an atomic layer is facilitated, so that the purpose of prolonging the service life of the photoluminescence nanometer material film is achieved. 本发明涉及一种光致发光的纳米材料薄膜边缘的保护方法，所述方法通过原子层沉积的方法在光致发光的纳米材料薄膜边缘沉积隔离层，所述隔离层能阻隔氧气和水，从而延长光致发光的纳米材料薄膜的使用寿命；所述原子层沉积的过程需要光致发光的纳米材料薄膜边缘具有本发明所述胶水材料，所述胶水材料的表面含有羟基，其有利于原子层的沉积，从而实现延长光致发光的纳米材料薄膜使用寿命的目的。