SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSING METHOD

The invention provides a substrate liquid processing apparatus and a substrate liquid processing method capable of supplying a processing liquid to a substrate at a precise concentration. The substrate liquid processing apparatus includes a tank (102); a circulation line (104); a processing unit (16...

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Bibliographische Detailangaben
Hauptverfasser:	TAKAKI YASUHIRO, KOMIYA HIROSHI, SATAKE KEIGO, NOBUKUNI CHIKARA, ANAMOTO ATSUSHI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PHYSICS REGULATING SEMICONDUCTOR DEVICES SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
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Beschreibung
Zusammenfassung:	The invention provides a substrate liquid processing apparatus and a substrate liquid processing method capable of supplying a processing liquid to a substrate at a precise concentration. The substrate liquid processing apparatus includes a tank (102); a circulation line (104); a processing unit (16) connected to the circulation line through a branch line (112) and configured to perform a liquid processing on a substrate using a processing liquid flowing through the circulation line; a processing liquid producing mechanism (206A,206B,208) configured to produce the processing liquid by mixing at least two kinds of raw material liquids supplied from respective raw material liquid sources at a controlled mixing ratio; a concentration measuring device (212(or 212')) configured to measure a concentration of the processing liquid flowing through the circulation line and a concentration of the processing liquid flowing through the processing liquid supply line; and a control device (4) configured to control the proc