Silicon wafer cleaning method and cleaning device

The invention provides a silicon wafer cleaning method and a cleaning device. The silicon wafer cleaning method comprises the following steps: after liquid medicine is used to etch a silicon wafer, the silicon wafer is immersed in an immersion tank containing ultrapure water for cleaning; after the silicon wafer in the immersion tank is taken out, the silicon wafer is sequentially placed in an Nthwashing tank, an (N-1)th washing tank,..., and a first washing tank for being washed, and after washing in the first washing tank is completed, the silicon wafer is taken out and washing is completed; the first washing tank is provided with washing liquid to be in an overflowing state, the washing liquid overflowing from the first washing tank is supplied to the second washing tank, in a similarfashion, the washing liquid overflowing from the (N-1)th washing tank is supplied to the Nth washing tank, wherein N is an integer larger than 1. Through the above method, the liquid medicine on the surface of the silicon wafe