Wafer type gap detection sensor for detecting a gap of the wafer chamber
The present invention relates to a wafer type gap detection sensor for detecting a gap of a wafer chamber, comprising: a substrate housing formed in a wafer shape; an electrostatic sensor assembly including a first electrostatic sensor unit and a second electrostatic sensor unit that are mounted wit...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The present invention relates to a wafer type gap detection sensor for detecting a gap of a wafer chamber, comprising: a substrate housing formed in a wafer shape; an electrostatic sensor assembly including a first electrostatic sensor unit and a second electrostatic sensor unit that are mounted with a preset distance from the substrate housing; a power supply unit for supplying power to the electrostatic sensor assembly; and a control unit that acquires first distance information between the first electrostatic sensor unit and a chamber inner nozzle on the basis of a first capacitance value obtained by the first electrostatic sensor unit, that acquires second distance information between the second electrostatic sensor unit and the chamber inner nozzle on the basis of a second capacitancevalue obtained by the second electrostatic sensor unit, and that forms the gap information on the basis of the first distance information and the second distance information.
本发明涉及一种对晶圆腔室的间隙进行检测的晶圆式间隙检测传感器,包括:基板外壳,以晶圆形状构成;静电 |
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