Nano-imprinting device capable of preparing complex microstructure
The invention discloses a nano-imprinting device capable of preparing a complex microstructure. A method comprises the steps of firstly, unwinding a substrate by an unwinding roller; applying photoresist to the substrate by a glue application roller; conveying the substrate to the lower part of the...
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| creator | ZHEMING ZHANG GONGCHENG ZHENG JINGPENG LI DIANZHENG WANG JIN ZHANG ZISU XU BIN FU JIEQIONG LIN KAITUO FENG XINYU CANG DEEN DAI ZHENGFA YI QUN ZHANG YAN GU MINGMING LU |
| description | The invention discloses a nano-imprinting device capable of preparing a complex microstructure. A method comprises the steps of firstly, unwinding a substrate by an unwinding roller; applying photoresist to the substrate by a glue application roller; conveying the substrate to the lower part of the imprinting device; heating the photoresist to a vitrification temperature by a heating roller; carrying out imprinting by an imprinting roller I, and then carrying out curing; removing a residual layer through an etching device; returning the substrate to the lower part of the imprinting device again, and then carrying out heating; rotating an imprinting roller II to the upper part of the photoresist subjected to the first-time imprinting by a rotating disc; carrying out imprinting by the imprinting roller II; and after imprinting by the imprinting roller II, repeating the steps until an imprinting roller III finishes imprinting, and winding the obtained substrate with the complex microstructure through a winding r |
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A method comprises the steps of firstly, unwinding a substrate by an unwinding roller; applying photoresist to the substrate by a glue application roller; conveying the substrate to the lower part of the imprinting device; heating the photoresist to a vitrification temperature by a heating roller; carrying out imprinting by an imprinting roller I, and then carrying out curing; removing a residual layer through an etching device; returning the substrate to the lower part of the imprinting device again, and then carrying out heating; rotating an imprinting roller II to the upper part of the photoresist subjected to the first-time imprinting by a rotating disc; carrying out imprinting by the imprinting roller II; and after imprinting by the imprinting roller II, repeating the steps until an imprinting roller III finishes imprinting, and winding the obtained substrate with the complex microstructure through a winding r</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Nano-imprinting device capable of preparing complex microstructure |
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