Nano-imprinting device capable of preparing complex microstructure

The invention discloses a nano-imprinting device capable of preparing a complex microstructure. A method comprises the steps of firstly, unwinding a substrate by an unwinding roller; applying photoresist to the substrate by a glue application roller; conveying the substrate to the lower part of the imprinting device; heating the photoresist to a vitrification temperature by a heating roller; carrying out imprinting by an imprinting roller I, and then carrying out curing; removing a residual layer through an etching device; returning the substrate to the lower part of the imprinting device again, and then carrying out heating; rotating an imprinting roller II to the upper part of the photoresist subjected to the first-time imprinting by a rotating disc; carrying out imprinting by the imprinting roller II; and after imprinting by the imprinting roller II, repeating the steps until an imprinting roller III finishes imprinting, and winding the obtained substrate with the complex microstructure through a winding r