METHOD AND APPARATUS FOR INSPECTION AND METROLOGY

A method includes: evaluating, with respect to a parameter representing remaining uncertainty of a mathematical model fitting measured data, one or more mathematical models for fitting measured data and one or more measurement sampling schemes for measuring data, against measurement data across a su...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MOS EVERHARDUS CORNELIS, JENSEN ERIK, WALLERBOS ERIK JOHANNES MARIA, KUBIS MICHAEL, IGNATOVA VELSILAVA ANGELOVA, TEN BERGE PETER, WILDENBERG JO SEBASTIAAN, SIMONS HUBERTUS JOHANNES GERTRUDUS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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