METHOD AND APPARATUS FOR INSPECTION AND METROLOGY

A method includes: evaluating, with respect to a parameter representing remaining uncertainty of a mathematical model fitting measured data, one or more mathematical models for fitting measured data and one or more measurement sampling schemes for measuring data, against measurement data across a su...

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Bibliographische Detailangaben
Hauptverfasser:	MOS EVERHARDUS CORNELIS, JENSEN ERIK, WALLERBOS ERIK JOHANNES MARIA, KUBIS MICHAEL, IGNATOVA VELSILAVA ANGELOVA, TEN BERGE PETER, WILDENBERG JO SEBASTIAAN, SIMONS HUBERTUS JOHANNES GERTRUDUS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method includes: evaluating, with respect to a parameter representing remaining uncertainty of a mathematical model fitting measured data, one or more mathematical models for fitting measured data and one or more measurement sampling schemes for measuring data, against measurement data across a substrate, and identifying one or more mathematical models and/or one or more measurement sampling schemes, for which the parameter crosses a threshold. 一种方法，包括：根据横跨衬底的测量数据，相对于表示拟合测得数据的数学模型的剩余不确定性的参数，对用于拟合测得数据的一个或多个数学模型和用于对数据进行测量的一个或多个测量采样方案进行评价；以及标识参数越过阈值的一个或多个数学模型和/或一个或多个测量采样方案。