Methods and apparatus for correcting substrate deformity
Embodiments of methods and apparatus for correcting substrate deformity are provided herein. In some embodiments, a substrate support includes a base having an interior volume formed by walls extending upward from the base; a plurality of infrared lamps disposed within the interior volume; a support...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | Embodiments of methods and apparatus for correcting substrate deformity are provided herein. In some embodiments, a substrate support includes a base having an interior volume formed by walls extending upward from the base; a plurality of infrared lamps disposed within the interior volume; a support plate disposed above the plurality of infrared lamps, wherein the support plate includes a supportsurface to support a substrate; and a cover plate disposed atop the support plate and having a central opening corresponding to the support surface and an exhaust portion at a periphery of a top surface of the cover plate, wherein the exhaust portion includes a plurality of perforations fluidly coupling a space above the cover plate with an exhaust conduit formed in the cover plate. Embodiments ofa showerhead assembly and processing equipment incorporating the inventive substrate support and showerhead assembly are additionally provided herein.
本文提供用于校正基板变形的方法和设备的实施方式。在一些实施方式中,一种基板支撑件包括:基部,具有由从所述基部向上延伸的壁形成的内部容积;多个红外灯, |
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