METHODS AND APPARATUS TO CONTROL GRAYSCALE PHOTOLITHOGRAPHY

Methods and apparatus to control grayscale lithography are disclosed. A disclosed example apparatus for adjusting a grayscale lithography process includes an optical measurement device 206 to optically measure portions 302,304,310,320 of a patterned wafer 300, and a processor 1012 to calculate a pro...

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Bibliographische Detailangaben

Hauptverfasser:	SHERWIN LUCIUS M, BEARD CHRIS MURRAY, ZHENG SONG, BOORANANUT NOPPAWAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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