METHODS AND APPARATUS TO CONTROL GRAYSCALE PHOTOLITHOGRAPHY

METHODS AND APPARATUS TO CONTROL GRAYSCALE PHOTOLITHOGRAPHY

Methods and apparatus to control grayscale lithography are disclosed. A disclosed example apparatus for adjusting a grayscale lithography process includes an optical measurement device 206 to optically measure portions 302,304,310,320 of a patterned wafer 300, and a processor 1012 to calculate a pro...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SHERWIN LUCIUS M, BEARD CHRIS MURRAY, ZHENG SONG, BOORANANUT NOPPAWAN
Format: Patent
Sprache:chi ; eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:Methods and apparatus to control grayscale lithography are disclosed. A disclosed example apparatus for adjusting a grayscale lithography process includes an optical measurement device 206 to optically measure portions 302,304,310,320 of a patterned wafer 300, and a processor 1012 to calculate a profile 401 based on the measured portions, and to determine an adjustment of the grayscale lithographyprocess based on the calculated profile. The disclosed apparatus also includes an adjuster 202 to control the grayscale lithography process based on the adjustment. 本发明揭示用以控制灰度光刻的方法及设备。用于调整灰度光刻过程的所揭示实例设备包含：光学测量装置(206)，其用以光学测量经图案化晶片(300)的部分(302、304、310、320)；及处理器(1012)，其用以基于所述经测量部分计算轮廓(401)，及基于所述经计算轮廓(401)确定对所述灰度光刻过程的调整。所述所揭示设备还包含用以基于所述调整控制所述灰度光刻过程的调整器(202)。