DEPOSITION SYSTEM
According to the present disclosure, a processing system (100) for depositing one or more layers on a substrate supported by a carrier is provided. The processing system includes: a load lock chamber(110) for loading a substrate; a routing module (410) for transporting the substrate; a first vacuum...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | According to the present disclosure, a processing system (100) for depositing one or more layers on a substrate supported by a carrier is provided. The processing system includes: a load lock chamber(110) for loading a substrate; a routing module (410) for transporting the substrate; a first vacuum swing module (131); and a process module (510) including a deposition source for depositing material; a service module (610); an unload lock chamber (116) for unloading the substrate; a further routing module (412); a mask carrier magazine (320) configured for storing and transporting masks employed during operation of the processing system; a further vacuum swing module (132); and a transportation system (710) configured for transporting the carrier between the first vacuum swing module (131)and the further vacuum swing module (132).
根据本公开内容,提供一种用于在由载体支撑的基板上沉积一个或多个层的处理系统(100)。处理系统包括:装载锁定腔室(110),用于装载基板;路由模块(410),用于输送基板;第一真空摆动模块(131);和处理模块(510),包括沉积源,沉积源用于沉积材料;维修模块(610);卸载锁定腔室(116),用于卸载基板;另外的路由模块(412);掩模载体匣(320),经配置 |
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