METAL MASK MATERIAL AND METHOD FOR MANUFACTURING SAME
The purpose of the present invention is to provide a metal mask material which has a very small number of fine oxide-based nonmetallic inclusions and is capable of exhibiting excellent etching processability. Provided are: a metal mask material which has composition containing, in mass%, 0.01% or le...
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| creator | HADANO YUUICHI OMORI AKIHIRO |
| description | The purpose of the present invention is to provide a metal mask material which has a very small number of fine oxide-based nonmetallic inclusions and is capable of exhibiting excellent etching processability. Provided are: a metal mask material which has composition containing, in mass%, 0.01% or less of C, 0.5% or less of Si, 1.0% or less of Mn, and 30-50% of Ni, with the remainder comprising Feand inevitable impurities, wherein, per 1 g of the metal mask material, the number of oxide-based nonmetallic inclusions having a diameter greater than 10.0 Mum is 2.0 or less and the number of oxide-based nonmetallic inclusions having a diameter of 6.0-10.0 Mum is 20.0 or less, and the metal mask material is in the shape of a thin plate having a plate thickness of 0.25 mm or less; and a method for manufacturing the metal mask material.
本发明的目的在于提供一种金属掩模用原材料，其氧化物系非金属夹杂物微细，个数也非常少，能够呈现优异的蚀刻加工性。一种金属掩模用原材料及其制造方法，所述金属掩模用原材料具有以质量％计，含有C：0.01％以下、Si：0.5％以下、Mn：1.0％以下、Ni：30％～50％，剩余部分为Fe及不可避免的杂质的组成，其中，所述金属掩模用原材料每1g中，直径超过10.0μm的氧化物 |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN109715834A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN109715834A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN109715834A3</originalsourceid><addsrcrecordid>eNrjZDD1dQ1x9FHwdQz2BhIhrkGeQJ6jn4sCUNzD30XBzT8IKO4X6uboHBIa5OnnrhDs6OvKw8CalphTnMoLpbkZFN1cQ5w9dFML8uNTiwsSk1PzUkvinf0MDSzNDU0tjE0cjYlRAwDMhydr</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METAL MASK MATERIAL AND METHOD FOR MANUFACTURING SAME</title><source>esp@cenet</source><creator>HADANO YUUICHI ; OMORI AKIHIRO</creator><creatorcontrib>HADANO YUUICHI ; OMORI AKIHIRO</creatorcontrib><description>The purpose of the present invention is to provide a metal mask material which has a very small number of fine oxide-based nonmetallic inclusions and is capable of exhibiting excellent etching processability. Provided are: a metal mask material which has composition containing, in mass%, 0.01% or less of C, 0.5% or less of Si, 1.0% or less of Mn, and 30-50% of Ni, with the remainder comprising Feand inevitable impurities, wherein, per 1 g of the metal mask material, the number of oxide-based nonmetallic inclusions having a diameter greater than 10.0 Mum is 2.0 or less and the number of oxide-based nonmetallic inclusions having a diameter of 6.0-10.0 Mum is 20.0 or less, and the metal mask material is in the shape of a thin plate having a plate thickness of 0.25 mm or less; and a method for manufacturing the metal mask material.
本发明的目的在于提供一种金属掩模用原材料，其氧化物系非金属夹杂物微细，个数也非常少，能够呈现优异的蚀刻加工性。一种金属掩模用原材料及其制造方法，所述金属掩模用原材料具有以质量％计，含有C：0.01％以下、Si：0.5％以下、Mn：1.0％以下、Ni：30％～50％，剩余部分为Fe及不可避免的杂质的组成，其中，所述金属掩模用原材料每1g中，直径超过10.0μm的氧化物</description><language>chi ; eng</language><subject>ALLOYS ; CHEMISTRY ; FERROUS OR NON-FERROUS ALLOYS ; METALLURGY ; METALLURGY OF IRON ; PRETREATMENT OF RAW MATERIALS ; PROCESSING OF PIG-IRON, e.g. REFINING, MANUFACTURE OFWROUGHT-IRON OR STEEL ; PRODUCTION AND REFINING OF METALS ; TREATMENT IN MOLTEN STATE OF FERROUS ALLOYS ; TREATMENT OF ALLOYS OR NON-FERROUS METALS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190503&DB=EPODOC&CC=CN&NR=109715834A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190503&DB=EPODOC&CC=CN&NR=109715834A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HADANO YUUICHI</creatorcontrib><creatorcontrib>OMORI AKIHIRO</creatorcontrib><title>METAL MASK MATERIAL AND METHOD FOR MANUFACTURING SAME</title><description>The purpose of the present invention is to provide a metal mask material which has a very small number of fine oxide-based nonmetallic inclusions and is capable of exhibiting excellent etching processability. Provided are: a metal mask material which has composition containing, in mass%, 0.01% or less of C, 0.5% or less of Si, 1.0% or less of Mn, and 30-50% of Ni, with the remainder comprising Feand inevitable impurities, wherein, per 1 g of the metal mask material, the number of oxide-based nonmetallic inclusions having a diameter greater than 10.0 Mum is 2.0 or less and the number of oxide-based nonmetallic inclusions having a diameter of 6.0-10.0 Mum is 20.0 or less, and the metal mask material is in the shape of a thin plate having a plate thickness of 0.25 mm or less; and a method for manufacturing the metal mask material.
本发明的目的在于提供一种金属掩模用原材料，其氧化物系非金属夹杂物微细，个数也非常少，能够呈现优异的蚀刻加工性。一种金属掩模用原材料及其制造方法，所述金属掩模用原材料具有以质量％计，含有C：0.01％以下、Si：0.5％以下、Mn：1.0％以下、Ni：30％～50％，剩余部分为Fe及不可避免的杂质的组成，其中，所述金属掩模用原材料每1g中，直径超过10.0μm的氧化物</description><subject>ALLOYS</subject><subject>CHEMISTRY</subject><subject>FERROUS OR NON-FERROUS ALLOYS</subject><subject>METALLURGY</subject><subject>METALLURGY OF IRON</subject><subject>PRETREATMENT OF RAW MATERIALS</subject><subject>PROCESSING OF PIG-IRON, e.g. REFINING, MANUFACTURE OFWROUGHT-IRON OR STEEL</subject><subject>PRODUCTION AND REFINING OF METALS</subject><subject>TREATMENT IN MOLTEN STATE OF FERROUS ALLOYS</subject><subject>TREATMENT OF ALLOYS OR NON-FERROUS METALS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDD1dQ1x9FHwdQz2BhIhrkGeQJ6jn4sCUNzD30XBzT8IKO4X6uboHBIa5OnnrhDs6OvKw8CalphTnMoLpbkZFN1cQ5w9dFML8uNTiwsSk1PzUkvinf0MDSzNDU0tjE0cjYlRAwDMhydr</recordid><startdate>20190503</startdate><enddate>20190503</enddate><creator>HADANO YUUICHI</creator><creator>OMORI AKIHIRO</creator><scope>EVB</scope></search><sort><creationdate>20190503</creationdate><title>METAL MASK MATERIAL AND METHOD FOR MANUFACTURING SAME</title><author>HADANO YUUICHI ; OMORI AKIHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN109715834A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2019</creationdate><topic>ALLOYS</topic><topic>CHEMISTRY</topic><topic>FERROUS OR NON-FERROUS ALLOYS</topic><topic>METALLURGY</topic><topic>METALLURGY OF IRON</topic><topic>PRETREATMENT OF RAW MATERIALS</topic><topic>PROCESSING OF PIG-IRON, e.g. REFINING, MANUFACTURE OFWROUGHT-IRON OR STEEL</topic><topic>PRODUCTION AND REFINING OF METALS</topic><topic>TREATMENT IN MOLTEN STATE OF FERROUS ALLOYS</topic><topic>TREATMENT OF ALLOYS OR NON-FERROUS METALS</topic><toplevel>online_resources</toplevel><creatorcontrib>HADANO YUUICHI</creatorcontrib><creatorcontrib>OMORI AKIHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HADANO YUUICHI</au><au>OMORI AKIHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METAL MASK MATERIAL AND METHOD FOR MANUFACTURING SAME</title><date>2019-05-03</date><risdate>2019</risdate><abstract>The purpose of the present invention is to provide a metal mask material which has a very small number of fine oxide-based nonmetallic inclusions and is capable of exhibiting excellent etching processability. Provided are: a metal mask material which has composition containing, in mass%, 0.01% or less of C, 0.5% or less of Si, 1.0% or less of Mn, and 30-50% of Ni, with the remainder comprising Feand inevitable impurities, wherein, per 1 g of the metal mask material, the number of oxide-based nonmetallic inclusions having a diameter greater than 10.0 Mum is 2.0 or less and the number of oxide-based nonmetallic inclusions having a diameter of 6.0-10.0 Mum is 20.0 or less, and the metal mask material is in the shape of a thin plate having a plate thickness of 0.25 mm or less; and a method for manufacturing the metal mask material.
本发明的目的在于提供一种金属掩模用原材料，其氧化物系非金属夹杂物微细，个数也非常少，能够呈现优异的蚀刻加工性。一种金属掩模用原材料及其制造方法，所述金属掩模用原材料具有以质量％计，含有C：0.01％以下、Si：0.5％以下、Mn：1.0％以下、Ni：30％～50％，剩余部分为Fe及不可避免的杂质的组成，其中，所述金属掩模用原材料每1g中，直径超过10.0μm的氧化物</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ALLOYS CHEMISTRY FERROUS OR NON-FERROUS ALLOYS METALLURGY METALLURGY OF IRON PRETREATMENT OF RAW MATERIALS PROCESSING OF PIG-IRON, e.g. REFINING, MANUFACTURE OFWROUGHT-IRON OR STEEL PRODUCTION AND REFINING OF METALS TREATMENT IN MOLTEN STATE OF FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FERROUS METALS |
| title | METAL MASK MATERIAL AND METHOD FOR MANUFACTURING SAME |
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