METAL MASK MATERIAL AND METHOD FOR MANUFACTURING SAME

The purpose of the present invention is to provide a metal mask material which has a very small number of fine oxide-based nonmetallic inclusions and is capable of exhibiting excellent etching processability. Provided are: a metal mask material which has composition containing, in mass%, 0.01% or less of C, 0.5% or less of Si, 1.0% or less of Mn, and 30-50% of Ni, with the remainder comprising Feand inevitable impurities, wherein, per 1 g of the metal mask material, the number of oxide-based nonmetallic inclusions having a diameter greater than 10.0 Mum is 2.0 or less and the number of oxide-based nonmetallic inclusions having a diameter of 6.0-10.0 Mum is 20.0 or less, and the metal mask material is in the shape of a thin plate having a plate thickness of 0.25 mm or less; and a method for manufacturing the metal mask material. 本发明的目的在于提供一种金属掩模用原材料，其氧化物系非金属夹杂物微细，个数也非常少，能够呈现优异的蚀刻加工性。一种金属掩模用原材料及其制造方法，所述金属掩模用原材料具有以质量％计，含有C：0.01％以下、Si：0.5％以下、Mn：1.0％以下、Ni：30％～50％，剩余部分为Fe及不可避免的杂质的组成，其中，所述金属掩模用原材料每1g中，直径超过10.0μm的氧化物