Exposure device, exposure method and manufacturing method of element
The invention discloses an exposure device which comprises an optical lens module and a lighting module, wherein the optical lens module is provided with an aperture diaphragm, and the aperture diaphragm is used for adjusting a numerical aperture of the optical lens module to enable the optical lens...
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| creator | SUN JINGLU TIAN YIQIANG |
| description | The invention discloses an exposure device which comprises an optical lens module and a lighting module, wherein the optical lens module is provided with an aperture diaphragm, and the aperture diaphragm is used for adjusting a numerical aperture of the optical lens module to enable the optical lens module to have a first numerical aperture and a second numerical aperture, wherein the first numerical aperture is greater than the second numerical aperture; and the lighting module is used for providing a first lighting source and a second lighting source, a center wavelength of the first lighting source is smaller than a center wavelength of the second lighting source, and a spectral line width of the second lighting source is greater than a spectral line width of the first lighting source.According to the invention, switching between a high-resolution mode and a high-yield mode is implemented by selection and switching of the numerical apertures and the lighting sources. Further, by adopting an exposure method |
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Further, by adopting an exposure method</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190416&DB=EPODOC&CC=CN&NR=109634059A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190416&DB=EPODOC&CC=CN&NR=109634059A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SUN JINGLU</creatorcontrib><creatorcontrib>TIAN YIQIANG</creatorcontrib><title>Exposure device, exposure method and manufacturing method of element</title><description>The invention discloses an exposure device which comprises an optical lens module and a lighting module, wherein the optical lens module is provided with an aperture diaphragm, and the aperture diaphragm is used for adjusting a numerical aperture of the optical lens module to enable the optical lens module to have a first numerical aperture and a second numerical aperture, wherein the first numerical aperture is greater than the second numerical aperture; and the lighting module is used for providing a first lighting source and a second lighting source, a center wavelength of the first lighting source is smaller than a center wavelength of the second lighting source, and a spectral line width of the second lighting source is greater than a spectral line width of the first lighting source.According to the invention, switching between a high-resolution mode and a high-yield mode is implemented by selection and switching of the numerical apertures and the lighting sources. Further, by adopting an exposure method</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHBxrSjILy4tSlVISS3LTE7VUUiFCeSmlmTkpygk5qUo5CbmlaYlJpeUFmXmpcMk8tMUUnNSc1PzSngYWNMSc4pTeaE0N4Oim2uIs4duakF-fGpxQWJyal5qSbyzn6GBpZmxiYGppaMxMWoA09QzDw</recordid><startdate>20190416</startdate><enddate>20190416</enddate><creator>SUN JINGLU</creator><creator>TIAN YIQIANG</creator><scope>EVB</scope></search><sort><creationdate>20190416</creationdate><title>Exposure device, exposure method and manufacturing method of element</title><author>SUN JINGLU ; TIAN YIQIANG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN109634059A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>SUN JINGLU</creatorcontrib><creatorcontrib>TIAN YIQIANG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SUN JINGLU</au><au>TIAN YIQIANG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Exposure device, exposure method and manufacturing method of element</title><date>2019-04-16</date><risdate>2019</risdate><abstract>The invention discloses an exposure device which comprises an optical lens module and a lighting module, wherein the optical lens module is provided with an aperture diaphragm, and the aperture diaphragm is used for adjusting a numerical aperture of the optical lens module to enable the optical lens module to have a first numerical aperture and a second numerical aperture, wherein the first numerical aperture is greater than the second numerical aperture; and the lighting module is used for providing a first lighting source and a second lighting source, a center wavelength of the first lighting source is smaller than a center wavelength of the second lighting source, and a spectral line width of the second lighting source is greater than a spectral line width of the first lighting source.According to the invention, switching between a high-resolution mode and a high-yield mode is implemented by selection and switching of the numerical apertures and the lighting sources. Further, by adopting an exposure method</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Exposure device, exposure method and manufacturing method of element |
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