Exposure device, exposure method and manufacturing method of element

The invention discloses an exposure device which comprises an optical lens module and a lighting module, wherein the optical lens module is provided with an aperture diaphragm, and the aperture diaphragm is used for adjusting a numerical aperture of the optical lens module to enable the optical lens module to have a first numerical aperture and a second numerical aperture, wherein the first numerical aperture is greater than the second numerical aperture; and the lighting module is used for providing a first lighting source and a second lighting source, a center wavelength of the first lighting source is smaller than a center wavelength of the second lighting source, and a spectral line width of the second lighting source is greater than a spectral line width of the first lighting source.According to the invention, switching between a high-resolution mode and a high-yield mode is implemented by selection and switching of the numerical apertures and the lighting sources. Further, by adopting an exposure method