Optical lens system, exposure device, exposure method and manufacturing method of element

The invention provides an optical lens system, an exposure device, an exposure method and a manufacturing method of an element. The optical lens system comprises a first lens group, a second lens group, a third lens group and a fourth lens group which are sequentially arranged from an object region to an image region along the optical axis direction of the optical lens system, wherein the first lens group at least comprises a meniscus lens, a convex lens and a biconcave lens which are sequentially arranged from an object area to an image area; the second lens group is at least provided with aconcave lens and a convex lens which are sequentially arranged from the object area to the image area. According to the optical lens system provided by the invention, through selection and combinationof the lenses in the first lens group and the second lens group, the numerical aperture is improved, and the optical lens system has higher resolution, for example, when the optical lens system is applied to a photoetching pr