PLASMA TREATMENT APPARATUS

To provide a plasma treatment apparatus designed to shorten the return current path and ensure symmetry. The plasma treatment apparatus according to an embodiment of the present invention is providedwith a main chamber body, a stage, a high frequency electrode, multiple grounding members and a movable unit. The main chamber body has side walls, a portion of which includes an opening through whicha substrate can pass. The multiple grounding members are disposed around the stage and electrically connect a side wall to the stage. The movable unit has a support for supporting a first grounding member, which is a portion of the multiple grounding members. The movable unit is configured so as to be capable of moving the support between a first position in which the first grounding member facesthe inner circumferential surface of the opening with the opening therebetween and a second position in which the first grounding member is electrically connected to the inner circumferential surface. 课题：提供种能够实现缩短返回电流路径和确保对称性的