Lithography optics adjustment and monitoring

Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number o...

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Bibliographische Detailangaben
Hauptverfasser:	TAHBOUB KHALID KHULUSI, THORNES JOSHUA JON, BIBBY JR THOMAS FREDERICK ALLEN, SUBRAMANIAN ABHISHEK, HARAN DONALD JAMES, DUFFEY THOMAS PATRICK, ZURITA OMAR, ROKITSKI ROSTISLAV
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY PHOTOGRAPHY PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Methods and apparatus for processing an image of a beam generated by an optical system to extract information indicative of an extent of damage to optical elements in the optical system. Also disclosed is a beam image and analysis tool capable of acquiring an image of a beam at any one of a number of locations. 用于处理由光学系统生成的光束的图像以提取指示光学系统中的光学元件的损坏程度的信息的方法和设备。还公开了种能够在多个位置中的任何个位置处获取光束的图像的光束图像和分析工具。