TARGETED PRODUCTION OF 2,2,3,3-TETRASILYL TETRASILANE

The subject matter of the present invention is octasilane 2,2,3,3-tetrasilyl tetrasilane 1, compositions which have, in addition to 2,2,3,3-tetrasilyl tetrasilane 1, one or more other constituents which are not 1, a method for producing 2,2,3,3-tetrasilyl tetrasilane 1 and mixtures of higher hydrido...

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Bibliographische Detailangaben
Hauptverfasser:	STUGER HARALD, HAAS MICHAEL, WUNNICKE ODO, CHRISTOPOULOS VIKTOR-STAVROS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ADHESIVES CHEMICAL PAINT OR INK REMOVERS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF CORRECTING FLUIDS DIFFUSION TREATMENT OF METALLIC MATERIAL DYES FILLING PASTES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INKS INORGANIC CHEMISTRY METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-METALLIC ELEMENTS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	The subject matter of the present invention is octasilane 2,2,3,3-tetrasilyl tetrasilane 1, compositions which have, in addition to 2,2,3,3-tetrasilyl tetrasilane 1, one or more other constituents which are not 1, a method for producing 2,2,3,3-tetrasilyl tetrasilane 1 and mixtures of higher hydridosilanes having 1. Further subject matter of the present invention is the use of 1 and mixtures of higher hydridosilanes having 1, for depositing material containing silicon. 本发明提供了辛硅烷2,2,3,3-四甲硅烷基丁硅烷1、包含除了2,2,3,3-四甲硅烷基丁硅烷1之外种或多种不是1的附加成分的组合物、制备2,2,3,3-四甲硅烷基丁硅烷1以及包含1的高级氢硅烷的混合物的方法。本发明进步提供了1以及包含1的高级氢硅烷的混合物用于沉积含硅材料的用途。