Manufacturing method of color film substrate, color film substrate and liquid crystal display
The invention discloses a manufacturing method of a color film substrate. The manufacturing method comprises the following steps: step one, establishing an off-state emergent spectrum-cell gap relatedmodel; step two, computing the corresponding first cell gap, the second cell gap and the third call...
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The invention discloses a manufacturing method of a color film substrate. The manufacturing method comprises the following steps: step one, establishing an off-state emergent spectrum-cell gap relatedmodel; step two, computing the corresponding first cell gap, the second cell gap and the third call gap when reaching the required R waveband off-state emergent state, the G waveband off-state emergent state and the B waveband off-state emergent state; step three, manufacturing a required color film substrate, wherein one surface, towards a liquid crystal layer, of the required color film substrate has different height, so that the required liquid crystal display as the first cell gap at a R region, has the second cell gap at a G region, and has the third cell gap at a B region. Through the manufacturing method disclosed by the invention, the required liquid crystal display can be controlled to possess the required off-state emergent rates at the red-ray waveband, the blue-ray waveband and the green-ray waveband, |
---|