Manufacturing method of color film substrate, color film substrate and liquid crystal display

The invention discloses a manufacturing method of a color film substrate. The manufacturing method comprises the following steps: step one, establishing an off-state emergent spectrum-cell gap relatedmodel; step two, computing the corresponding first cell gap, the second cell gap and the third call...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: WU ZHENZHONG, REN BAOTAO, LI LIN, LIU FALIN, XIN JIEPING
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses a manufacturing method of a color film substrate. The manufacturing method comprises the following steps: step one, establishing an off-state emergent spectrum-cell gap relatedmodel; step two, computing the corresponding first cell gap, the second cell gap and the third call gap when reaching the required R waveband off-state emergent state, the G waveband off-state emergent state and the B waveband off-state emergent state; step three, manufacturing a required color film substrate, wherein one surface, towards a liquid crystal layer, of the required color film substrate has different height, so that the required liquid crystal display as the first cell gap at a R region, has the second cell gap at a G region, and has the third cell gap at a B region. Through the manufacturing method disclosed by the invention, the required liquid crystal display can be controlled to possess the required off-state emergent rates at the red-ray waveband, the blue-ray waveband and the green-ray waveband,