GAS FLUSHING DEVICE

The invention relates to a gas flushing device for installing into a metallurgical vessel, having the following features when assembled in the base of the metallurgical vessel: a largely gas-tight lower base part is provided, a gas line runs in the base part from a first end in the region of a first outer surface of the base part to a second end in the region of a second outer surface of the basepart, the second end of the gas line is designed as the first section of a coupling, the second section of the coupling is located in the region of an outer connection surface of the functional part which lies against the base part by means of the connection surface, in the functional position, a gas distributing device runs from the second section of the coupling to the at least one free functional part surface designed as a gas discharge surface through the functional part, and the base part and the functional part each consists of a refractory ceramic material. 本发明涉及种用于安装在冶金炉中的气体净化装置，所述装置在安装在所述冶金炉的底部中的位置中具有如下特征：-很大