VACUUM DEPOSITION APPARATUS AND DEVICE MANUFACTURING METHOD USING THE SAME

The present invention provides a vacuum deposition device. The vacuum deposition device includes: the vacuum chamber defining a deposition space, in which a deposition process on a deposition object is performed, while being maintained in a vacuum state; an evaporation source unit which is installed to move in the vacuum chamber and including an evaporation source accommodating a deposition material deposited to the deposition object; and a rotary moving unit installed between the surface forming the vacuum chamber and the evaporation source unit, wherein one end of the rotary moving unit is connected to the evaporation source unit to be able to rotate and the other end is connected to the surface forming the vacuum chamber to be able to rotate. The surface forming the vacuum chamber and the other end of the rotary moving unit connected to the surface forming the vacuum chamber to be able to rotate are connected to relatively move in a first direction of facing the evaporation source unit. 本发明提供种真空蒸镀装置，所述真空蒸镀