Gas distribution device for low-concentration standard gas and gas distribution method

The invention discloses a gas distribution device for a low-concentration standard gas and a gas distribution method adopting the gas distribution device. The gas distribution device comprises a gas generating component and a dilute gas distributing component, wherein the gas generating component co...

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Bibliographische Detailangaben
Hauptverfasser: SHEN FEIZHOU, YANG YANNAN, XIE LEI, ZHAI ZHIBIN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses a gas distribution device for a low-concentration standard gas and a gas distribution method adopting the gas distribution device. The gas distribution device comprises a gas generating component and a dilute gas distributing component, wherein the gas generating component comprises a main gas chamber, a first gas pump, a gas source chamber and a gas sensor; the main gas chamber, the first gas pump and the gas source chamber are connected with each other through a gas circuit; the gas sensor is arranged in the gas circuit; a first valve is jointed between the main gas chamber and the first gas pump; the gas source chamber is connected with the main gas chamber through a second valve, so as to form a circulating gas circuit; the dilute gas distributing component comprises a gas feeding component and a gas distributing component. According to the technical scheme of the invention, a target gas in a known concentration is generated by utilizing the physicochemicalcharacteristics of materi