Concentration management device of development liquid and development processing system of base plate

The invention provides a concentration management device of development liquid which can manage development liquid used for developing of a base plate to be in the optimal state and a development processing system of a base plate. In a base plate processing system, the concentration management devic...

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Bibliographische Detailangaben
1. Verfasser:	TOSHIMOTO NAKAGAWA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention provides a concentration management device of development liquid which can manage development liquid used for developing of a base plate to be in the optimal state and a development processing system of a base plate. In a base plate processing system, the concentration management device (B) of development liquid, a development processing device (A), a preparing device (E) preparing new liquid of development liquid, and a regenerator (F) used for generating the development liquid being used are connected via a pipe. The concentration management device (B) of development liquid measures the physical property or the component concentration of development liquid of the development processing device (A) and supplies stoste or new liquid or regenerated liquid of development liquid,thus making the development liquid be in the optimal concentration. The supplied complementary liquid is measured by an accumulative flow meter (151, 152, 153, 154, 155) arranged on the pipe. Expenses of concentration manage