PRE-COATED SHIELD FOR USE IN VHF-RF PVD CHAMBERS

Implementations of the present disclosure relate to an improved shield for use in a processing chamber. In one implementation, the shield includes a hollow body having a cylindrical shape that is substantially symmetric about a central axis of the body, and a coating layer formed on an inner surface of the body. The coating layer is formed the same material as a sputtering target used in the processing chamber. The shield advantageously reduces particle contamination in films deposited using RF-PVD by reducing arcing between the shield and the sputtering target. Arcing is reduced by the presence of a coating layer on the interior surfaces of the shield. 本公开内容的实施方式涉及用于在处理腔室中使用的改良的屏蔽物。在个实施方式中，所述屏蔽物包括具有圆柱形状的中空主体和形成在主体的内表面上的涂覆层，所述圆柱形状大致上关于所述主体的中心轴对称。涂覆层由与在所述处理腔室中使用的溅射靶相同的材料形成。屏蔽物通过减少屏蔽物与溅射靶之间的发弧而有利地减少使用RF-PVD沉积的膜中的颗粒污染物。发弧因屏蔽物的内表面上存在涂覆层而减少。