Device and method for simultaneously measuring beam intensity and beam emittance

The invention relates to a device and method for simultaneously measuring beam intensity and beam emittance. The device mainly comprises position sampling slit plates in a horizontal direction and a vertical direction, angle sampling slit plates in a horizontal direction and a vertical direction, an...

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Bibliographische Detailangaben
Hauptverfasser: CHEN WEI, WANG ZHONGMING, WANG MINWEN, QU ERYUAN, WANG DI, QIU MENGTONG
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention relates to a device and method for simultaneously measuring beam intensity and beam emittance. The device mainly comprises position sampling slit plates in a horizontal direction and a vertical direction, angle sampling slit plates in a horizontal direction and a vertical direction, and a vacuum system. During the measurement of beam intensity, the intensity of an incident particle beam is obtained according to the sum of the currents received by Faraday cylinders at the position sampling slit plates, the angle sampling slit plates and Faraday cylinders behind the angle samplingslit plates. During the measurement of beam emittance, the position and the divergence angle of the beam are sampled under the driving of a motor, and the beam emittance is measured by measuring the positions of the two slit plates and a current signal received by the angle sampling slit plates. The device is compact in structure, easy to operate and easy to miniaturize, can measure the emittanceof the beam in both the ho