Multi-layer, stress-isolation platform for MEMS die
A multi-layer, stress-isolation platform is configured for attaching a MEMS die to a base includes a first platform; a first layer of attachment material between the base and the first platform and attaching the first platform to the base; a MEMS die; and a second layer of attachment material betwee...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | A multi-layer, stress-isolation platform is configured for attaching a MEMS die to a base includes a first platform; a first layer of attachment material between the base and the first platform and attaching the first platform to the base; a MEMS die; and a second layer of attachment material between the first platform and the MEMS die and attaching the MEMS die to the first platform.
种多层应力隔离平台,其配置为将MEMS裸芯附接至基部,其包括第平台;第层附接材料,其在所述基部与所述第平台之间,并且将所述第平台附接至所述基部;MEMS裸芯;以及第二层附接材料,其在所述第平台与所述MEMS裸芯之间,并且将所述MEMS裸芯附接至所述第平台。 |
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