Method for plasma nitriding at room temperature to prepare nanocrystal titanium nitride micropowder
The invention belongs to the technical field of metal nitride, and discloses a method of plasma nitriding at the room temperature to prepare nanocrystal titanium nitride micropowder. The method comprises the steps that under an atmosphere that nitrogen is continuously supplied, a plasma ball milling...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention belongs to the technical field of metal nitride, and discloses a method of plasma nitriding at the room temperature to prepare nanocrystal titanium nitride micropowder. The method comprises the steps that under an atmosphere that nitrogen is continuously supplied, a plasma ball milling device is adopted to conduct plasma nitriding ball milling on titanium powder at the room temperature, and the nanocrystal titanium nitride micropowder is obtained. The plasma is dielectric barrier discharging plasma. The specific parameters of plasma nitriding ball milling at the room temperatureare: the rotation speed is 600-1200rpm, the discharging current is 1-2.5A, the ratio of grinding media to material is 30:1-100:1, the ball milling time is 10-30 hours, and the pressure intensity of nitrogen is 0.05MPa-0.5MPa. The method is easy to operate and low in cost, the atmosphere pressure intensity is controllable and adjustable, the ball milling pollution is less, the grain size of the synthesized titanium nitride |
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