Novel method for preparing high-resolution line pattern

The invention discloses a novel method for preparing a high-resolution line pattern. The method comprises the following steps of (1) preparing an elastic stamp with a line pattern and an imprinting substrate which is used for carrying out spin coating on an imprinting adhesive, wherein the line widt...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YIN MINQI, WANG HAIBIN, SUN HONGWEN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES NANOTECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING
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