Novel method for preparing high-resolution line pattern

The invention discloses a novel method for preparing a high-resolution line pattern. The method comprises the following steps of (1) preparing an elastic stamp with a line pattern and an imprinting substrate which is used for carrying out spin coating on an imprinting adhesive, wherein the line width of the line pattern is the same as the size of a space between every two adjacent lines; (2) making the line width of the pattern on the elastic stamp become thinner by applying a stretching external force along a line length direction of the pattern, and fixing the elastic stamp; (3) enabling theelastic stamp to be in contact with the imprinting substrate of the spin-coating imprinting adhesive in an ultraviolet imprinting machine, and curing the imprinting adhesive by ultraviolet light; and(4) separating the elastic stamp from the imprinting substrate after the imprinting adhesive is cured, and carrying out subsequent pattern transfer. The novel method has the characteristics that theline width of the pattern o