LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

An apparatus includes an illumination system to condition a radiation beam, a support to support a patterning device capable of imparting the radiation beam with a pattern in its cross-section to forma patterned radiation beam, a substrate table constructed to hold a substrate, a projection system to project the patterned radiation beam onto a target portion of the substrate, and a control systemconfigured to: receive pattern data characterizing a pattern distribution, receive radiation data characterizing the radiation beam, determine a dissipation distribution of the pattern based on the pattern data and the radiation data, determine deformation of the pattern by applying the dissipation distribution in a thermo-mechanical model of the patterning device, and determine a control signalto control a component of the apparatus based on the deformation of the pattern. 种设备，包括：用于调节辐射束的照射系统；用于支撑图案形成装置的支撑件，图案形成装置能够在辐射束的截面中向辐射束赋予图案以形成经图案化的辐射束；被构造为保持衬底的衬底台；用于将经图案化的辐射束投射到衬底的目标部分上的投射系统；以及控制系统，控制系统被配置为：接收表征图案分布的图案数据，接收表征